兰州理工大学学报 ›› 2026, Vol. 52 ›› Issue (3): 47-52.

• 机械工程与动力工程 • 上一篇    下一篇

基于环形磁场的磁性复合流体抛光特性

王有良*, 张彤, 史小锋   

  1. 兰州理工大学 机电工程学院, 甘肃 兰州 730050
  • 收稿日期:2023-06-08 出版日期:2026-06-28 发布日期:2026-06-30
  • 通讯作者: 王有良(1986-),男,河南荥阳人,博士,副教授.Email:wangyouliang20@163.com
  • 基金资助:
    国家自然科学基金(52265056),甘肃省科技计划项目(21JR7RA228)

Polishing characteristics of magnetic compound fluid based on an annular magnetic field

WANG You-liang, ZHANG Tong, SHI Xiao-feng   

  1. School of Mechanical and Electrical Engineering, Lanzhou University of Technology, Lanzhou 730050, China
  • Received:2023-06-08 Online:2026-06-28 Published:2026-06-30

摘要: 针对光学平面元件在抛光过程中存在形貌精度降低的问题,提出了基于环形磁场的磁性复合流体抛光工艺.采用光学相机和触针粗糙度仪观察磁性复合流体成形特征和抛光前后工件表面粗糙度变化,并采用MAXWELL模拟工件表面磁场强度;同时,分析磁性复合流体组分、载液板转速nc、磁铁转速nm和加工间隙Δ对工件表面粗糙度Ra的影响规律,探究不同参数对表面质量的影响机理.结果表明:基于环形磁场的磁性复合流体抛光成为了适用于光学平面元件的环形抛光工艺;当采用组分为羰基铁粉40%、磨粒12%、α-纤维3%和磁流体45%的磁性复合流体,并且nc =300 r·m-1,nm =400 r·m-1,Δ =1 mm时,抛光20 min后能够获得最优表面质量;工件表面粗糙度Ra由0.592 μm降至0.035 μm,下降率为94.1%.由此证明,基于环形磁场的磁性复合流体抛光工艺具有良好的抛光性能.

关键词: 磁性复合流体, 环形磁场, 工艺参数, 表面粗糙度, 抛光性能

Abstract: In this paper, in order to solve the problems such as the reduction of topography accuracy in the polishing process of optical planar elements, a polishing process based on circular Magnetic compound fluid (MCF) was proposed. Optical camera and stylus roughness meter were used to observe the forming characteristics of magnetic composite fluid and the surface roughness changes of workpiece before and after polishing, and MAXWELL was used to simulate the surface magnetic field intensity of workpiece. At the same time, the influence rules of magnetic composite fluid components, liquid carrier plate speed nc, magnet speed nm, processing gap Δ on workpiece surface roughness Ra were analyzed, and the influence mechanism of different parameters on surface quality was explored. The results show that a ring polishing tool is formed based on the ring magnetic field MCF, which is suitable for polishing optical planar elements. The smoothest surface was obtained after 20 min polishing when the MCF containing carbonyl-iron powder 40%, abrasive particle 12%, α-fiber 3%, magnetic fluid 45% and nc =300 r·m-1, nm =400 r·m-1, Δ =1 mm. The workpiece surface roughness decreases from 0.592 μm to 0.035 μm, with a decrease rate of 94.1%. It is proved that MCF polishing tool under annular magnetic field show good polishing performance.

Key words: magnetic compound fluid, annular magnetic field, technological parameter, surface roughness, polishing performance

中图分类号: