Journal of Lanzhou University of Technology ›› 2026, Vol. 52 ›› Issue (3): 47-52.

• Mechanical Engineering and Power Engineering • Previous Articles     Next Articles

Polishing characteristics of magnetic compound fluid based on an annular magnetic field

WANG You-liang, ZHANG Tong, SHI Xiao-feng   

  1. School of Mechanical and Electrical Engineering, Lanzhou University of Technology, Lanzhou 730050, China
  • Received:2023-06-08 Online:2026-06-28 Published:2026-06-30

Abstract: In this paper, in order to solve the problems such as the reduction of topography accuracy in the polishing process of optical planar elements, a polishing process based on circular Magnetic compound fluid (MCF) was proposed. Optical camera and stylus roughness meter were used to observe the forming characteristics of magnetic composite fluid and the surface roughness changes of workpiece before and after polishing, and MAXWELL was used to simulate the surface magnetic field intensity of workpiece. At the same time, the influence rules of magnetic composite fluid components, liquid carrier plate speed nc, magnet speed nm, processing gap Δ on workpiece surface roughness Ra were analyzed, and the influence mechanism of different parameters on surface quality was explored. The results show that a ring polishing tool is formed based on the ring magnetic field MCF, which is suitable for polishing optical planar elements. The smoothest surface was obtained after 20 min polishing when the MCF containing carbonyl-iron powder 40%, abrasive particle 12%, α-fiber 3%, magnetic fluid 45% and nc =300 r·m-1, nm =400 r·m-1, Δ =1 mm. The workpiece surface roughness decreases from 0.592 μm to 0.035 μm, with a decrease rate of 94.1%. It is proved that MCF polishing tool under annular magnetic field show good polishing performance.

Key words: magnetic compound fluid, annular magnetic field, technological parameter, surface roughness, polishing performance

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